Improving dopant incorporation during femtosecond-laser doping of Si with a Se thin-film dopant precursor

Author： Smith Matthew Sher Meng-Ju Franta Benjamin Lin Yu-Ting Mazur Eric Gradečak Silvija

ISSN： 0947-8396

Source： Applied Physics A, Vol.114, Iss.4, 2014-03, pp. : 1009-1016

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