In Situ Nanolithography with Sub‐10 nm Resolution Realized by Thermally Assisted Spin‐Casting of a Self‐Assembling Polymer

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-4095|27|33|4814-4822

ISSN： 0935-9648

Source： ADVANCED MATERIALS, Vol.27, Iss.33, 2015-09, pp. : 4814-4822

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