Contamination of Magnetron Sputtered Metallic Films by Oxygen From Residual Atmosphere in Deposition Chamber

E-ISSN： 1612-8869|12|5|416-421

ISSN： 1612-8850

Source： PLASMA PROCESSES AND POLYMERS (ELECTRONIC), Vol.12, Iss.5, 2015-05, pp. : 416-421

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