Sulfur‐replaced Fenton systems: can sulfate radical substitute hydroxyl radical for advanced oxidation technologies?

Publisher: John Wiley & Sons Inc

E-ISSN: 1097-4660|90|5|775-779

ISSN: 0268-2575

Source: JOURNAL OF CHEMICAL TECHNOLOGY & BIOTECHNOLOGY, Vol.90, Iss.5, 2015-05, pp. : 775-779

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content