Ion implantation-reduced diffusion length in HgCdTe*

Author： Lévêque P.   Declémy A.   Renault P. O.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|2|3|223-226

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.2, Iss.3, 2010-03, pp. : 223-226

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