Reactive etching of SiC by energetic CF3: molecular dynamics simulation

Author: Gou F.   Chen Z.   Zhiqian C.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|38|2|129-134

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.38, Iss.2, 2007-03, pp. : 129-134

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Abstract