Author: Cristescu R. Mihaiescu D. Socol G. Stamatin I. Mihailescu I.N. Chrisey D.B.
Publisher: Springer Publishing Company
ISSN: 0947-8396
Source: Applied Physics A, Vol.79, Iss.4-6, 2004-09, pp. : 1023-1026
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Aluminum nitride thin films prepared by radical-assisted pulsed laser deposition
By Ishihara M. Yamamoto K. Kokai F. Koga Y.
Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. :
Pulsed laser deposition of boron nitride thin films
By Acacia N. Fazio E. Neri F. Ossi P. M. Trusso S. Santo N.
Radiation Effects and Defects in Solids, Vol. 163, Iss. 4-6, 2008-04 ,pp. :
Pulsed laser deposition of organic thin films
Thin Solid Films, Vol. 363, Iss. 1, 2000-03 ,pp. :
Stress generation during ion beam-assisted pulsed laser deposition of thin AlN films
Thin Solid Films, Vol. 415, Iss. 1, 2002-08 ,pp. :