UHVEM study of {113}-defect formation in Si nanowires

Author: Vanhellemont Jan   Anada Satoshi   Yasuda Hidehiro   Bender Hugo   Rooyackers Rita   Vandooren Anne   Vanhellemont Jan  

Publisher: IOP Publishing

E-ISSN: 1361-6641|30|11|114013-114023

ISSN: 0268-1242

Source: Semiconductor Science and Technology, Vol.30, Iss.11, 2015-11, pp. : 114013-114023

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