Facile non‐lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene‐block‐polydimethylsiloxane films

Publisher: John Wiley & Sons Inc

E-ISSN: 1099-0488|53|15|1058-1064

ISSN: 0887-6266

Source: Journal of Polymer Science Part B: Polymer Physics, Vol.53, Iss.15, 2015-08, pp. : 1058-1064

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content