Effect of Citric Acid in Chemical Mechanical Polishing (CMP) for Lithium Tantalate (LiTaO₃) Wafer

E-ISSN： 1662-8985|2015|806|305-310

ISSN： 1022-6680

Source： Advanced Materials Research, Vol.2015, Iss.806, 2015-12, pp. : 305-310

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