The Influences of Annealing Temperatures on the Properties of HfO₂ Thin Film and the Fabrication of SiO₂/HfO₂ Distributed Bragg Reflector

Publisher： Trans Tech Publications

E-ISSN： 1662-8985|2015|1101|238-241

ISSN： 1022-6680

Source： Advanced Materials Research, Vol.2015, Iss.1101, 2015-05, pp. : 238-241

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