Effects of Solvent on the Phase Composition and Microstructure of ZrSiO₄ Film

E-ISSN： 1662-8985|2015|1104|119-124

ISSN： 1022-6680

Source： Advanced Materials Research, Vol.2015, Iss.1104, 2015-06, pp. : 119-124

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Abstract

Zirconium silicate thin film was prepared via a novel non-hydrolytic sol-gel (NHSG) process at low temperature using zirconium tetrachloride (ZrCl₄) and tetraethoxysilane (TEOS) as precursors. The phase composition and the microstructure of samples were characterized by X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM), respectively. The results demonstrate that pure ZrSiO₄ film can be synthesized by using ethanol and isopropanol as solvent rather than dimethyl formamide (DMF) and dimethyl nylon acid (DBE) which cause impurity ZrO₂. However, only ethanol can achieved smooth and dense ZrSiO₄ film. The viscosity results suggest that the sol with ethanol has great stability. With a pulling rate of 1.0 mm s^-1, a high quality ZrSiO₄ film was prepared after drying at 50^oC for 2 h and calcination at 850 °C with a heating rate of 1.0 °C min^-1.