Co/Cu/Co Pseudo Spin-Valve System Prepared by Magnetron Sputtering with Different Argon Pressure

E-ISSN： 1662-9795|2015|644|211-214

ISSN： 1013-9826

Source： Key Engineering Materials, Vol.2015, Iss.644, 2015-06, pp. : 211-214

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Effect of Ti Sputtering Current on Structure of TiCrN Thin Films Prepared by Reactive DC Magnetron Co-Sputtering

Key Engineering Materials, Vol. 2016, Iss. 675, 2016-02 ,pp. : 181-184

Trans Tech Publications

Access to resources Recommend Favorite

Morphological and Magnetic Properties of Co_100-xCu_x Film Prepared by RF-Sputtering

Key Engineering Materials, Vol. 2015, Iss. 659, 2015-09 ,pp. : 599-603

Trans Tech Publications

Access to resources Recommend Favorite

CrN Coatings at Different Substrate Temperatures Prepared by Single D.C. Magnetron Sputtering Target

Key Engineering Materials, Vol. 2016, Iss. 680, 2016-03 ,pp. : 498-501

Trans Tech Publications

Access to resources Recommend Favorite

Study of Thin Film Pressure Sensor by Magnetron Sputtering

Key Engineering Materials, Vol. 2015, Iss. 645, 2015-06 ,pp. : 566-571

Trans Tech Publications

Access to resources Recommend Favorite

Reaction of Tungsten with Melts in the Cu - Co System

By Skorokhod V. Titov V. Sichkar' Z. Churakov M.

Powder Metallurgy and Metal Ceramics, Vol. 44, Iss. 5-6, 2005-05 ,pp. : 271-275

Springer Publishing Company

Access to resources Recommend Favorite