Nanoindentation du Si3N4 pour la microelectronique : influence de la sous-couche

Author: Coq Germanicus Rosine   Eve Sophie   Lallemand Florent   Hug Eric  

Publisher: Edp Sciences

E-ISSN: 1778-3771|103|6|606-606

ISSN: 0032-6895

Source: Matériaux & Techniques, Vol.103, Iss.6, 2015-12, pp. : 606-606

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content