A Recent Patent on Microwave Plasma Chemical Vapor-Deposited Diamond Film on Cutting Tools

E-ISSN： 1874-477x|10|2|140-143

ISSN： 2212-7976

Source： Recent Patents on Mechanical Engineering, Vol.10, Iss.2, 2017-07, pp. : 140-143

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Abstract

Background: Among the various technologies for the chemical vapor deposition of diamond,Microwave Plasma CVD (MPCVD) is a widely used technique for high quality diamond films.It has been proven that the growth rate and quality of diamond can be improved by increasing theplasma power density and gas pressure.lt;Pgt

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