TFT中PECVD氮化硅成膜参数对成膜速率的影响研究

Publisher: 国家哲学社会科学学术期刊数据库

E-ISSN: 2095-8374|volume|10|56-57

ISSN: 2095-8374

Source: 名城绘, Vol.volume, Iss.10, 2017-01, pp. : 56-57

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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Abstract