HF-Last Wet Clean in Combination with a Low Temperature GeH₄-Assisted HCl In Situ Clean Prior to Si_0.8Ge_0.2-on-Si Epitaxial Growth

Publisher： Trans Tech Publications

E-ISSN： 1662-9779|2014|219|20-23

ISSN： 1012-0394

Source： Solid State Phenomena, Vol.2014, Iss.219, 2014-01, pp. : 20-23

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