Publisher： Trans Tech Publications
E-ISSN： 1662-9779|2016|254|97-101
ISSN： 1012-0394
Source： Solid State Phenomena, Vol.2016, Iss.254, 2016-10, pp. : 97-101
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Abstract
Ti-Ta films were deposited out of Ti and Ta targets on glass and kapton substrates. The co-deposition leaded to the formation of a compositional spread in the Ti-Ta system, a continuous variation of the Ta/Ti ratio along the full range of the film. The typical microstructure observed for the films deposited at RT consisted of columnar grains with dotted Ta-rich particles, reflecting a relatively nonhomogenous structure. Annealing at 400 °C leaded to the individualization of grain boundaries and to a coalescence of the Ta-rich particles. Annealing at 500 °C further reduced the amount of particles, but also appeared to be associated with the cracking in the stressed area of the film/kapton structure.
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