In situ diagnostic of etch plasmas for process control using quantum cascade laser absorption spectroscopy

Author： Lang N. Röpcke J. Wege S. Steinbach A.

E-ISSN： 1286-0050|49|1|13110-13110

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.49, Iss.1, 2010-01, pp. : 13110-13110

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