Publisher： Edp Sciences
E-ISSN： 1764-7177|02|C2|C2-509-C2-537
ISSN： 1155-4339
Source： Le Journal de Physique IV, Vol.02, Iss.C2, 1991-09, pp. : C2-509-C2-537
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
DIAMOND CHEMICAL VAPOUR DEPOSITION
Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. :
Access to resources
Recommend
SILICON CARBIDE CHEMICAL VAPOUR INFILTRATION
Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. :
Neutron News, Vol. 24, Iss. 2, 2013-04 ,pp. :
EAS Publications Series, Vol. 46, Iss. issue, 2011-03 ,pp. :
Chemical Vapour Deposition for Optical Fibre Technology
Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. :