![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Publisher: Edp Sciences
E-ISSN: 1764-7177|10|PR2|Pr2-43-Pr2-48
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.10, Iss.PR2, 2000-02, pp. : Pr2-43-Pr2-48
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Monitoring of SiC Deposition in an Industrial CVI/CVD Reactor by In-Situ FTIR Spectroscopy
Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
In-situ-spectroscopic monitoring for SIC-CVD process control
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Laser CVD of silicon nanoclusters and in-situ process chataracterization
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
![](/images/ico/o.png)
![](/images/ico/ico5.png)
In-situ monitoring of ammonia gas using an optical fibre based approach
Journal of Physics: Conference Series , Vol. 307, Iss. 1, 2011-08 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
In-situ process monitoring of MOCVD of superconducting and dielectric oxide thin films
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :