The role of the substrate surface area/reactor volume ratio in chemistry and kinetics of chemical vapor deposition

Publisher： Edp Sciences

E-ISSN： 1764-7177|09|PR8|Pr8-79-Pr8-84

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.09, Iss.PR8, 1999-09, pp. : Pr8-79-Pr8-84

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

The role of the pore surface area/pore volume ratio in chemical vapor infiltration

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-73-Pr8-77

Edp Sciences

Access to resources Recommend Favorite

Chemical vapor deposition of silicon carbide at various temperatures and surface area/volume ratios

By  

Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. : Pr3-55-Pr3-62

Edp Sciences

Access to resources Recommend Favorite

Chemistry and kinetics of chemical vapor deposition of pyrolytic carbon from methane

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-41-Pr8-47

Edp Sciences

Access to resources Recommend Favorite

Hydrodynamic and Chemical Modeling of a Chemical Vapor Deposition Reactor for Zirconia Deposition

By  

Journal de Physique III, Vol. 7, Iss. 9, 1997-09 ,pp. : 1779-1796

Edp Sciences

Access to resources Recommend Favorite

Theoretical analysis of a mass conservation equation for a surface reaction between two parallel plates of a chemical vapor deposition reactor

By  

Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. : Pr8-133-Pr8-140

Edp Sciences

Access to resources Recommend Favorite