Related content

AMORPHOUS SILICON NITRIDE THIN FILMS PERFORMED IN TWO PECVD EXPERIMENTAL DEVICES

By  

Le Journal de Physique Colloques, Vol. 50, Iss. C5, 1989-05 ,pp. : C5-657-C5-664

Edp Sciences

Access to resources Recommend Favorite

Thermal conductivity of aluminium nitride thin films prepared by reactive magnetron sputtering

By Duquenne C   Besland M-P   Tessier P Y   Gautron E   Scudeller Y   Averty D  

Journal of Physics D: Applied Physics, Vol. 45, Iss. 1, 2012-01 ,pp. : 15301-15308

IOP Publishing

Access to resources Recommend Favorite

Improved piezoelectric constants of sputtered aluminium nitride thin films by pre-conditioning of the silicon surface

By Schneider M   Bittner A   Schmid U  

Journal of Physics D: Applied Physics, Vol. 48, Iss. 40, 2015-10 ,pp. : 405301-405307

IOP Publishing

Access to resources Recommend Favorite

GROWTH OF THIN ALUMINA FILM ON ALUMINIUM AT ROOM TEMPERATURE : A KINETIC AND SPECTROSCOPIC STUDY BY SURFACE PLASMON EXCITATION

By  

Le Journal de Physique Colloques, Vol. 44, Iss. C10, 1983-12 ,pp. : C10-205-C10-208

Edp Sciences

Access to resources Recommend Favorite

Kinetics of LPCVD of aluminium nitride films based on pyrolysis of aluminium chloride complex

By  

Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. : Pr3-155-Pr3-161

Edp Sciences

Access to resources Recommend Favorite