Magnetic properties of silicon-iron laminations Si-enriched by a SiH4 based CVD process

Publisher: Edp Sciences

E-ISSN: 1764-7177|08|PR2|Pr2-535-Pr2-538

ISSN: 1155-4339

Source: Le Journal de Physique IV, Vol.08, Iss.PR2, 1998-06, pp. : Pr2-535-Pr2-538

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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