Unique precursor delivery and control afforded by low-pressure pulsed-CVD process with ultrasonic atomization

E-ISSN： 1764-7177|11|PR3|Pr3-1161-Pr3-1168

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.11, Iss.PR3, 2001-08, pp. : Pr3-1161-Pr3-1168

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

INFLUENCE OF THE FILAMENT MATERIAL ON LOW-PRESSURE HOT-FILAMENT CVD DIAMOND DEPOSITION

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-923-C2-930

Edp Sciences

Access to resources Recommend Favorite

A pulsed-periodic low-pressure volume discharge in a krypton-chlorine gas mixture

By Shuaibov A. Dashchenko A. Shimon L. Shevera I.

Technical Physics Letters, Vol. 28, Iss. 8, 2002-08 ,pp. : 702-704

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Spot patterns and instabilities in a pulsed low-pressure rf glow discharge

By Voronov M Hoffmann V Steingrobe T Buscher W Engelhard C Storey A P Ray S J Hieftje G M

Plasma Sources Science and Technology, Vol. 23, Iss. 5, 2014-10 ,pp. : 54009-54013

IOP Publishing

Access to resources Recommend Favorite

Peculiarities of plasma decay in the afterglow of a low-pressure pulsed discharge in oxygen

By Kudryavtsev A. Kuranov A. Mishakov V. Tkachenko T. Skoblo I. Chaika M.

Technical Physics, Vol. 46, Iss. 3, 2001-03 ,pp. : 299-306

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Current interruption in a low-pressure high-current pulsed discharge with hollow cathode

Journal of Physics: Conference Series , Vol. 552, Iss. 1, 2014-11 ,pp. : 103-109

IOP Publishing

Access to resources Recommend Favorite