Applications of the technique of electronic and nuclear double resonance (endor) to donors in silicon.

Publisher: Edp Sciences

E-ISSN: 0368-3842|19|11|830-833

ISSN: 0368-3842

Source: Journal de Physique et le Radium, Vol.19, Iss.11, 1958-11, pp. : 830-833

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next