COMPORTEMENT PHYSICO-CHIMIQUE DE Si3N4 OBTENU PAR LPCVD SOUMIS A DES FLUX RADIATIFS INTENSES

Publisher: Edp Sciences

E-ISSN: 0449-1947|50|C5|C5-353-C5-362

ISSN: 0449-1947

Source: Le Journal de Physique Colloques, Vol.50, Iss.C5, 1989-05, pp. : C5-353-C5-362

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next