X-RAY SCATTERING MEASUREMENTS OF SILICON OXIDES ON SILICON

Publisher： Edp Sciences

E-ISSN： 0449-1947|50|C7|C7-145-C7-152

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.50, Iss.C7, 1989-10, pp. : C7-145-C7-152

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Small-angle X-ray scattering study of the microstructure of highly porous silicon

By  

Le Journal de Physique IV, Vol. 03, Iss. C8, 1993-12 ,pp. : C8-349-C8-352

Edp Sciences

Access to resources Recommend Favorite

Study of gallium arsenide on silicon by small angle X-ray scattering

By  

Le Journal de Physique IV, Vol. 03, Iss. C8, 1993-12 ,pp. : C8-381-C8-384

Edp Sciences

Access to resources Recommend Favorite

Development of X-ray silicon microcalorimeters

By Agnese P.  

EAS Publications Series, Vol. 37, Iss. issue, 2009-06 ,pp. : 89-93

Edp Sciences

Access to resources Recommend Favorite

TIME RESOLVED X-RAY ABSORPTION MEASUREMENTS ON PULSED LASER IRRADIATED THIN SILICON FOILS AND SILICON PLASMAS

By  

Le Journal de Physique Colloques, Vol. 47, Iss. C8, 1986-12 ,pp. : C8-193-C8-198

Edp Sciences

Access to resources Recommend Favorite

Crystallization behavior of polyethylene on silicon wafers in solution casting processes traced by time-resolved measurements of synchrotron grazing-incidence small-angle and wide-angle X-ray scattering

By  

Journal of Physics: Conference Series , Vol. 184, Iss. 1, 2009-08 ,pp. : 73-78

IOP Publishing

Access to resources Recommend Favorite