Nanowire Arrays: In Situ Formation of Crystallographically Oriented Semiconductor Nanowire Arrays via Selective Vaporization for Optoelectronic Applications (Adv. Mater. 35/2016)

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-4095|28|35|7551-7551

ISSN： 0935-9648

Source： ADVANCED MATERIALS, Vol.28, Iss.35, 2016-09, pp. : 7551-7551

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

In Situ Formation of Crystallographically Oriented Semiconductor Nanowire Arrays via Selective Vaporization for Optoelectronic Applications

By  

ADVANCED MATERIALS, Vol. 28, Iss. 35, 2016-09 ,pp. : 7603-7612

John Wiley & Sons Inc

Access to resources Recommend Favorite

Electronic Skin: Bioinspired Interlocked and Hierarchical Design of ZnO Nanowire Arrays for Static and Dynamic Pressure‐Sensitive Electronic Skins (Adv. Funct. Mater. 19/2015)

By  

ADVANCED FUNCTIONAL MATERIALS, Vol. 25, Iss. 19, 2015-05 ,pp. : 2840-2840

John Wiley & Sons Inc

Access to resources Recommend Favorite

Graphene Arrays: Direct Top‐Down Fabrication of Large‐Area Graphene Arrays by an In Situ Etching Method (Adv. Mater. 28/2015)

By  

ADVANCED MATERIALS, Vol. 27, Iss. 28, 2015-07 ,pp. : 4194-4194

John Wiley & Sons Inc

Access to resources Recommend Favorite

Masthead: (Adv. Mater. 35/2016)

By  

ADVANCED MATERIALS, Vol. 28, Iss. 35, 2016-09 ,pp. : n/a-n/a

John Wiley & Sons Inc

Access to resources Recommend Favorite

Contents: (Adv. Mater. 35/2016)

By  

ADVANCED MATERIALS, Vol. 28, Iss. 35, 2016-09 ,pp. : 7553-7563

John Wiley & Sons Inc

Access to resources Recommend Favorite