Integrated low‐temperature process for the fabrication of amorphous Si nanoparticles embedded in Al2O3 for non‐volatile memory application (Phys. Status Solidi A 9∕2016)

Publisher： John Wiley & Sons Inc

E-ISSN： 1862-6319|213|9|2540-2540

ISSN： 1862-6300

Source： PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Vol.213, Iss.9, 2016-09, pp. : 2540-2540

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