Publisher: Edp Sciences
E-ISSN: 1764-7177|132|issue|83-86
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.132, Iss.issue, 2006-03, pp. : 83-86
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Low-temperature deposition of ultrathin SiO2 films on Si substrates
Journal of Physics: Conference Series , Vol. 514, Iss. 1, 2014-05 ,pp. :
Ultra-Thin Ferroelectric Films Modified by Bi2SiO5
By Kijima Takeshi Ishiwara Hiroshi
Ferroelectrics, Vol. 271, Iss. 1, 2002-01 ,pp. :
SURFACE MECHANISMS IN THE UVCVD OF SiO
Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. :