Publisher： Edp Sciences
E-ISSN： 2261-236x|8|issue|05009-05009
ISSN： 2261-236x
Source： MATEC Web of conference, Vol.8, Iss.issue, 2013-11, pp. : 05009-05009
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Abstract
We report on the fabrication of 3D micro-structures in fused silica glass using chemical etching along femtosecond laser irradiated zones. In particular, we exploited a novel approach combining two different etching agents in successive steps: the hydrofluoric acid, which provides fast volume removal, and potassium hydroxide, which exhibits high selectivity. We demonstrated that this hybrid approach enables a more easy prototyping and fabrication of complex geometries for microfluidic devices.
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