Nanoimprint Resist Material Containing Ultraviolet Reactive Fluorine Surfactant for Defect Reduction in Lithographic Fabrication

Author： Takei Satoshi Sekiguchi Atsushi

Publisher： MDPI

E-ISSN： 2076-3417|2|1|24-34

ISSN： 2076-3417

Source： Applied Sciences, Vol.2, Iss.1, 2012-01, pp. : 24-34

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