A Study of Trimethylsilane (3MS) and Tetramethylsilane (4MS) Based α-SiCN:H/α-SiCO:H Diffusion Barrier Films

Author： Chen Sheng-Wen Wang Yu-Sheng Hu Shao-Yu Lee Wen-Hsi Chi Chieh-Cheng Wang Ying-Lang

Publisher： MDPI

E-ISSN： 1996-1944|5|3|377-384

ISSN： 1996-1944

Source： Materials, Vol.5, Iss.3, 2012-03, pp. : 377-384

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