Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films

Author: Œmietana Mateusz   Mroczyński Robert   Kwietniewski Norbert  

Publisher: MDPI

E-ISSN: 1996-1944|7|2|1249-1260

ISSN: 1996-1944

Source: Materials, Vol.7, Iss.2, 2014-02, pp. : 1249-1260

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