Improved PNIPAAm-Hydrogel Photopatterning by Process Optimisation with Respect to UV Light Sources and Oxygen Content

Author： Haefner Sebastian   Rohn Mathias   Frank Philipp   Paschew Georgi   Elstner Martin   Richter Andreas  

Publisher： MDPI

E-ISSN： 2310-2861|2|1|10-10

ISSN： 2310-2861

Source： Gels, Vol.2, Iss.1, 2016-03, pp. : 10-10

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Which Light for Cultural Heritage: Comparison of Light Sources with Respect to Realgar Photodegradation

By Macchia A.   Cesaro S.   Campanella L.   Maras A.   Rocchia M.   Roscioli G.  

Journal of Applied Spectroscopy, Vol. 80, Iss. 5, 2013-11 ,pp. : 637-643

Springer Publishing Company

Access to resources Recommend Favorite

Dietary Carotenoids Regulate Astaxanthin Content of Copepods and Modulate Their Susceptibility to UV Light and Copper Toxicity

By Caramujo Maria-José   de Carvalho Carla C. C. R.   Silva Soraya J.   Carman Kevin R.  

Marine Drugs, Vol. 10, Iss. 5, 2012-04 ,pp. : 998-1018

MDPI

Access to resources Recommend Favorite

Ferrocene-Decorated Hyperbranched Poly(aroxycarbonylphenylene)s: Synthesis, Light Refraction, Photopatterning and Precursor to Magnetic Ceramics

By Jim Cathy  

Journal of Inorganic and Organometallic Polymers and Materials, Vol. 23, Iss. 1, 2013-01 ,pp. : 147-157

Springer Publishing Company

Access to resources Recommend Favorite

UV Light Induces Dedoping of Polyaniline

By Kaitsuka Yuki   Goto Hiromasa  

Polymers, Vol. 8, Iss. 2, 2016-01 ,pp. : 34-34

MDPI

Access to resources Recommend Favorite

Comparison of Conventional Varnishes with Nanolacke UV Varnish With Respect to Hardness and Adhesion Durability

By Kaygin Bulent   Akgun Emre  

International Journal of Molecular Sciences, Vol. 9, Iss. 4, 2008-04 ,pp. : 476-485

MDPI

Access to resources Recommend Favorite