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Plasma Processing with Fluorine Chemistry for Modification of Surfaces Wettability

Author: Satulu Veronica   Ionita Maria Daniela   Vizireanu Sorin   Mitu Bogdana   Dinescu Gheorghe  

Publisher: MDPI

E-ISSN: 1420-3049|21|12|1711-1711

ISSN: 1420-3049

Source: Molecules, Vol.21, Iss.12, 2016-12, pp. : 1711-1711

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Abstract

Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by plasma treatment in a sulphur hexafluoride environment. We showed that conformal fluorinated thin films can be obtained and, according to the initial surface properties, superhydrophobic surfaces can be achieved.