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Influence of Substrate Temperature on Deposition Rate and Optical Properties of Aluminum Oxide Thin Films Prepared by Reactive DC Sputtering Technique

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Effect of post annealing on MgO thin film prepared on silicon(001) substrate in high oxygen pressure and high substrate temperature by pulsed laser deposition

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Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite

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