Chemical Composition of Boron Carbonitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamineborane

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MAIK Nauka/Interperiodica

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Microstructure and Chemical Bonding in Silicon Carbonitride Films Synthesized by Plasma Enhanced Chemical Vapor Deposition

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Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films

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Materials, Vol. 7, Iss. 2, 2014-02 ,pp. : 1249-1260

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Plasma Enhanced Chemical Vapor Deposition of Fluorinated Amorphous Carbon Thin Films from Tetrafluoroethylene and Tetraisocyanatesilane

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Pulsed-Spray Radiofrequency Plasma Enhanced Chemical Vapor Deposition of CuInS₂ Thin Films

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