Heavily Boron-Doped Silicon Layer for the Fabrication of Nanoscale Thermoelectric Devices

Author： Ma Zhe Liu Yang Deng Lingxiao Zhang Mingliang Zhang Shuyuan Ma Jing Song Peishuai Liu Qing Ji An Yang Fuhua Wang Xiaodong

Publisher： MDPI

E-ISSN： 2079-4991|8|2|77-77

ISSN： 2079-4991

Source： Nanomaterials, Vol.8, Iss.2, 2018-01, pp. : 77-77

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