Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor

Author: Hu Chih-Kai   Chen Chun-Jung   Wei Ta-Chin   Li Tomi T.   Huang Chih-Yung   Chao Chu-Li   Lin Yi-Jiun  

Publisher: MDPI

E-ISSN: 2079-6412|7|8|112-112

ISSN: 2079-6412

Source: Coatings, Vol.7, Iss.8, 2017-07, pp. : 112-112

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Abstract