Effect of the SiCl4 Flow Rate on SiBN Deposition Kinetics in SiCl4-BCl3-NH3-H2-Ar Environment

Author： Li Jianping   Qin Hailong   Liu Yongsheng   Ye Fang   Li Zan   Cheng Laifei   Zhang Litong  

Publisher： MDPI

E-ISSN： 1996-1944|10|6|627-627

ISSN： 1996-1944

Source： Materials, Vol.10, Iss.6, 2017-06, pp. : 627-627

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