Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching

Author: Gul Banat   Tinck Stefan   Rehman Aman-ur-   Bogaerts Annemie   Gul Banat  

Publisher: IOP Publishing

E-ISSN: 1361-6463|48|2|25202-25210

ISSN: 0022-3727

Source: Journal of Physics D: Applied Physics, Vol.48, Iss.2, 2015-01, pp. : 25202-25210

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Abstract