Topological characterization of antireflective and hydrophobic rough surfaces: are random process theory and fractal modeling applicable?

Publisher： IOP Publishing

E-ISSN： 1361-6463|48|4|45301-45312

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.48, Iss.4, 2015-02, pp. : 45301-45312

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