Nanocrystalline silicon embedded in silicon suboxide synthesized in high-density inductively coupled plasma

Publisher： IOP Publishing

E-ISSN： 1361-6463|48|44|445302-445309

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.48, Iss.44, 2015-11, pp. : 445302-445309

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