Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering

Publisher: IOP Publishing

E-ISSN: 1361-6463|48|47|475303-475310

ISSN: 0022-3727

Source: Journal of Physics D: Applied Physics, Vol.48, Iss.47, 2015-12, pp. : 475303-475310

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Abstract