Room Temperature Oxide Deposition Approach to Fully Transparent, All‐Oxide Thin‐Film Transistors

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-4095|27|40|6090-6095

ISSN： 0935-9648

Source： ADVANCED MATERIALS, Vol.27, Iss.40, 2015-10, pp. : 6090-6095

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Skin‐Like Oxide Thin‐Film Transistors for Transparent Displays

By  

ADVANCED FUNCTIONAL MATERIALS, Vol. 26, Iss. 34, 2016-09 ,pp. : 6170-6178

John Wiley & Sons Inc

Access to resources Recommend Favorite

Transparent Displays: Skin‐Like Oxide Thin‐Film Transistors for Transparent Displays (Adv. Funct. Mater. 34/2016)

By  

ADVANCED FUNCTIONAL MATERIALS, Vol. 26, Iss. 34, 2016-09 ,pp. : 6319-6319

John Wiley & Sons Inc

Access to resources Recommend Favorite

Low‐Temperature, Nontoxic Water‐Induced Metal‐Oxide Thin Films and Their Application in Thin‐Film Transistors

By  

ADVANCED FUNCTIONAL MATERIALS, Vol. 25, Iss. 17, 2015-05 ,pp. : 2564-2572

John Wiley & Sons Inc

Access to resources Recommend Favorite

Green Processing of Metal Oxide Core–Shell Nanoparticles as Low‐Temperature Dielectrics in Organic Thin‐Film Transistors

By  

ADVANCED MATERIALS, Vol. 27, Iss. 39, 2015-10 ,pp. : 5950-5954

John Wiley & Sons Inc

Access to resources Recommend Favorite

Influence of the deposition pressure on the properties of transparent and conductive ZnO:Ga thin-film produced by r.f. sputtering at room temperature

By Assuncao V.   Fortunato E.   Marques A.   Aguas H.   Ferreira I.   Costa M.E.V.   Martins R.  

Thin Solid Films, Vol. 427, Iss. 1, 2003-03 ,pp. : 401-405

Elsevier

Access to resources Recommend Favorite