Synthesis of Epoxidised Silsesquioxane Polymer as Negative Photoresist in Photolithography Application

Publisher: Trans Tech Publications

E-ISSN: 1662-7482|2015|754|502-507

ISSN: 1660-9336

Source: Applied Mechanics and Materials, Vol.2015, Iss.754, 2015-05, pp. : 502-507

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Abstract