Characterization of Stoichiometric ZrO₂ Thin Film on Si by Angle-Resolved X-Ray Photoelectron Spectroscopy

E-ISSN： 1662-9795|2016|701|77-82

ISSN： 1013-9826

Source： Key Engineering Materials, Vol.2016, Iss.701, 2016-08, pp. : 77-82

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