Plasma depostion of BN, BCN:H and Me-BCN:H films using N-trimethylborazine (Me = Ti, Nb)

E-ISSN： 1286-4897|2|8|1391-1398

ISSN： 1155-4320

Source： Journal de Physique III, Vol.2, Iss.8, 1992-08, pp. : 1391-1398

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Structure and composition investigation of RPECVD SiCN and LPCVD BCN films

Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. : Pr3-987-Pr3-994

Edp Sciences

Access to resources Recommend Favorite

NEW COMPOUNDS OBTAINED BY LPCVD IN THE B-C-N CHEMICAL SYSTEM

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-673-C2-680

Edp Sciences

Access to resources Recommend Favorite

Dielectric Dispersion in (N(C2H5)4)2MeCl4 Crystals

By Tylczyński Z. Biskupski P. Słaboszewska M.

Ferroelectrics, Vol. 272, Iss. 1, 2002-01 ,pp. : 315-320

Taylor & Francis Ltd

Access to resources Recommend Favorite

ETUDE DES REACTIONS 3H(p, p)3H, 3He(p, p)3He et 3H(p, n)3He à Ep = 156 MeV

Le Journal de Physique Colloques, Vol. 31, Iss. C2, 1970-05 ,pp. : C2-81-C2-82

Edp Sciences

Access to resources Recommend Favorite

Indirect spin coupling in group VI compounds: TeMe 2 , SeMe 2 , HSeMe, H 2 Se

By Dreeskamp H. Pfisterer G.

Molecular Physics, Vol. 14, Iss. 3, 1968-01 ,pp. : 295-297

Taylor & Francis Ltd

Access to resources Recommend Favorite